Development of High-Brightness Field Gas Ion Source for Focused Ion beam Technology
Abstract: In recent years, focused ion beam (FIB) systems equipped with gallium liquid metal ion source have been used in wide application fields of nano-technology. On the other hand, FIB system has a serious problem which is the pollution of samples due to irradiated ion species. To solve the problem, we are developing a noble gas field ion source (GFIS) which scarcely gives rise to the pollution. The optimum shape of ion emitter to obtain higher angular current density is reported.
Key words: Field Ion Source, Focused Ion Beam, Field Induced Gas Etching, Tungsten, Argon