会誌・出版物 > 顕微鏡 (和文誌) > Vol.50, No.1, 2015 (English)


>> Vol.50, No.1, 2015 (Japanese)

Vol. 50  No. 1      2015
CONTENTS

■Foreword

In Order to Go beyond the Present Stage of Microscopy

Takayoshi Tanji

■Special Article

IMC and IFSM—Current Status and Future—

Kazuo Furuya

■Feature Articles: Fundamentals of Simulation for Electron Microscopy

Fundamentals of Simulation

Toyohiko Konno

Geometry of Electron Diffraction and Its Calculation

Toshihiro Kogure

Image Simulation for High-Resolution Electron Microscopy

Kazuo Ishizuka

The Basics of First Principles Calculation of EELS

Hidekazu Ikeno and Teruyasu Mizoguchi

Application of Multivariate Statistical Analysis to Spectrum-Imaging Datasets: Benefits and Disadvantages

Masashi Watanabe and Kazuo Ishizuka

■Reviews

Growth and Superiority of Epitaxial Graphene on SiC

Michiko Kusunoki and Wataru Norimatsu

Methods for the Analysis of Gene Expression Based on Morphological Science—Focusing on in situ Hybridization Method—

Shin-ichiro Hino, Narantsog Choijookhuu and Yoshitaka Hishikawa

Three-Dimensional Structural Analysis for Regulation of Neural Circuit in the Olfactory Bulb

Kazunori Toida, Emi Kiyokage, Yoshinori Suzuki and Masakazu Hamamoto

■Lectures

Biological Image Processing in the Quantitative Age

Yoshitaka Kimori

Basic Technologies of EPMA and Latest FE-EPMA

Hiroshi Sakamae and Hiroshi Hayashi

■Researches Today

Development of Zeff Imaging Using X-ray Interferometer

Akio Yoneyama, Rika Baba, Satoshi Takeya, Kazuyuki Hyodo and Tohoru Takeda

Development of Cc Corrector under the Triple C Project

Hidetaka Sawada, Fumio Hosokawa, Takeo Sasaki, Shuuichi Yuasa, Koji Katazakai, Shunsaku Waki, Muneyuki Kawazoe, Yuko Shimizu, Tomohiro Nakamichi and Kazutomo Suenaga

■From Microscopy: Editor’s Choice Articles

■Staff Commentary

Hidehiro Yasuda