Vol. 50 No. 1 2015
CONTENTS
■Foreword
In Order to Go beyond the Present Stage of Microscopy
Takayoshi Tanji
■Special Article
IMC and IFSM—Current Status and Future—
Kazuo Furuya
■Feature Articles: Fundamentals of Simulation for Electron Microscopy
Fundamentals of Simulation
Toyohiko Konno
Geometry of Electron Diffraction and Its Calculation
Toshihiro Kogure
Image Simulation for High-Resolution Electron Microscopy
Kazuo Ishizuka
The Basics of First Principles Calculation of EELS
Hidekazu Ikeno and Teruyasu Mizoguchi
Application of Multivariate Statistical Analysis to Spectrum-Imaging Datasets: Benefits and Disadvantages
Masashi Watanabe and Kazuo Ishizuka
■Reviews
Growth and Superiority of Epitaxial Graphene on SiC
Michiko Kusunoki and Wataru Norimatsu
Methods for the Analysis of Gene Expression Based on Morphological Science—Focusing on in situ Hybridization Method—
Shin-ichiro Hino, Narantsog Choijookhuu and Yoshitaka Hishikawa
Three-Dimensional Structural Analysis for Regulation of Neural Circuit in the Olfactory Bulb
Kazunori Toida, Emi Kiyokage, Yoshinori Suzuki and Masakazu Hamamoto
■Lectures
Biological Image Processing in the Quantitative Age
Yoshitaka Kimori
Basic Technologies of EPMA and Latest FE-EPMA
Hiroshi Sakamae and Hiroshi Hayashi
■Researches Today
Development of Zeff Imaging Using X-ray Interferometer
Akio Yoneyama, Rika Baba, Satoshi Takeya, Kazuyuki Hyodo and Tohoru Takeda
Development of Cc Corrector under the Triple C Project
Hidetaka Sawada, Fumio Hosokawa, Takeo Sasaki, Shuuichi Yuasa, Koji Katazakai, Shunsaku Waki, Muneyuki Kawazoe, Yuko Shimizu, Tomohiro Nakamichi and Kazutomo Suenaga
■From Microscopy: Editor’s Choice Articles
■Staff Commentary
Hidehiro Yasuda